公开(公告)号：US06806945B2

公开(公告)日：2004-10-19

申请号：US09948723

申请日：2001-09-10

申请人： Masaru Ise ,  Masaaki Matsuda

发明人： Masaru Ise ,  Masaaki Matsuda

IPC分类号： G03B2720

CPC分类号： G03F7/70425 ,  G03F7/2032

摘要： An automatic both sides exposing apparatus 1 is provided, and includes a first exposing mechanism 10 having a first mask and the second exposing mechanism 20 having a second mask; a carrying-in portion 2 and a carrying-out portion 30; an optical system for exposing the substrate; and a first holder A and a second holder B for holding the substrate and delivering the substrate from the first holder A to the second holder B with reversal of sides at a spot located in an interval between the first and second exposing mechanisms where both holders meet each other. Accordingly, a frequency at which the substrate is delivered is minimized, the substrate can be turned over without the reversing mechanism, the substrate can be transferred (and delivered) at good efficiency in limited space and exposed accurately, any inconvenient origin for the substrate may be minimized, and the apparatus is made compact.

摘要翻译： 提供自动双面曝光装置1，并且包括具有第一掩模的第一曝光机构10和具有第二掩模的第二曝光机构20; 搬入部2和搬出部30; 用于使衬底曝光的光学系统; 以及第一保持器A和第二保持器B，用于保持基板并将基板从第一保持器A输送到第二保持器B，在位于第一和第二曝光机构之间的间隔处的侧面反转， 彼此。 因此，基板被输送的频率最小化，可以在没有反转机构的情况下翻转基板，可以在有限的空间中以良好的效率将基板转移（并输送）并且准确地曝光，基板的任何不便的起因 最小化，并使设备紧凑。