公开(公告)号：US06193897B1

公开(公告)日：2001-02-27

申请号：US08887456

申请日：1997-07-02

申请人： Masaru Nikaido ,  Sachiko Hirahara ,  Yukio Okudo ,  Daizi Hirosawa ,  Hiroharu Takezawa

发明人： Masaru Nikaido ,  Sachiko Hirahara ,  Yukio Okudo ,  Daizi Hirosawa ,  Hiroharu Takezawa

IPC分类号： B44C122

CPC分类号： H01J9/142 ,  H01J2209/017

摘要： A shadow mask manufacturing method comprising the cleaning step performs rapid cleaning by spraying a cleaning solution, which is inert with respect to the band-like thin metal plate, upon upper and lower surfaces of the band-like thin metal plate and thereby generating cavitation near the surfaces of the band-like thin metal plate by using cavitation jet means, while regulating a position of the band-like thin metal plate and preventing the cleaning solution from leaking in a direction opposite to the conveyance direction of the band-like thin metal plate by using a first leakage-preventing seal unit provided upstream the cavitation jet means.

摘要翻译： 包括清洗步骤的荫罩制造方法通过在带状薄金属板的上表面和下表面上喷射对带状薄金属板是惰性的清洗液进行快速清洗，从而在附近产生气蚀 通过使用气蚀喷射装置，在调节带状薄金属板的位置并防止清洗液在与带状薄金属的输送方向相反的方向上泄漏的带状薄金属板的表面 通过使用设置在空化喷射装置上游的第一防漏密封单元。