公开(公告)号：US5225146A

公开(公告)日：1993-07-06

申请号：US789519

申请日：1991-11-08

申请人： Masayuki Ono ,  Harold Furth

发明人： Masayuki Ono ,  Harold Furth

IPC分类号： H05H1/12

CPC分类号： G21B1/057 ,  Y02E30/122 ,  Y02E30/128

摘要： An electron injection scheme for controlling transport in a tokamak plasma. Electrons with predominantly perpendicular energy are injected into a ripple field region created by a group of localized poloidal field bending magnets. The trapped electrons then grad-B drift vertically toward the plasma interior until they are detrapped, charging the plasma negative. Calculations indicate that the highly perpendicular velocity electrons can remain stable against kinetic instabilities in the regime of interest for tokamak experiments. The penetration distance can be controlled by controlling the "ripple mirror ratio", the energy of the injected electrons, and their v.sub..perp. /v.sub.51 ratio. In this scheme, the poloidal torque due to the injected radial current is taken by the magnets and not by the plasma. Injection is accomplished by the flat cathode containing an ECH cavity to pump electrons to high v.sub..perp..

摘要翻译： 用于控制托卡马克等离子体中的运输的电子注入方案。 具有主要垂直能量的电子注入由一组局部极向场弯曲磁体产生的纹波场区域中。 被捕获的电子然后grad-B垂直漂移到等离子体内部，直到它们被去除，将等离子体负片充电。 计算表明，对于托卡马克实验，高度垂直的速度电子可以保持稳定的动力学不稳定性。 可以通过控制“纹波反射比”，注入电子的能量以及它们的v ORTHOGONAL / V51比例来控制穿透距离。 在该方案中，由于注入的径向电流引起的极向扭矩由磁体而不是等离子体获取。 注入是通过包含ECH腔的平面阴极来实现的，以将电子泵送到高v正交。