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    Process for photoinitiated control of inorganic network formation in the sol-gel process
    1.
    发明授权
    Process for photoinitiated control of inorganic network formation in the sol-gel process 失效
    溶胶 - 凝胶法中无机网络形成的光引发控制方法

    公开(公告)号：US5360834A

    公开(公告)日：1994-11-01

    申请号：US188746

    申请日：1994-01-31

    申请人： Michael Popall ,  Jochen Schulz ,  Helmut Schmidt

    发明人： Michael Popall ,  Jochen Schulz ,  Helmut Schmidt

    IPC分类号： B01J13/00 ,  B01J19/12 ,  C03C1/00 ,  C03C17/02 ,  C03C17/25 ,  C08G4/00 ,  C08G77/02 ,  C08J3/28 ,  C08K3/18

    CPC分类号： B01J13/0039 ,  B01J19/123 ,  C03C1/008 ,  C03C17/02 ,  C03C17/25

    摘要： A process is described for photoinitiated control of inorganic network fotion in the sol-gel process, which comprises eitherA) subjecting one or more hydrolytically polycondensable compounds of constituent elements of glass or ceramic, excluding silicon compounds containing polymerizable organic groups, to hydrolytic polycondensation in a liquid reaction medium to form a sol and irradiating the resulting sol in a structured or unstructured manner in the presence of a photoinitiator which can change the pH of the reaction medium on irradiation, using radiation of a wavelength range in which the photoinitiator absorbs;orB) liberating water in an anhydrous reaction medium which contains an alcohol, one or more hydrolytically polycondensable compounds of constituent elements of glass or ceramic and a photoinitiator which can liberate water by a photochemical reaction or a secondary reaction when irradiated, by structured or non-structured irradiation using radiation of a wavelength range in which the photoinitiator absorbs, and in this way effecting the hydrolytic polycondensation.

    摘要翻译： 描述了在溶胶 - 凝胶法中对无机网络形成进行光引发控制的方法，其包括A）将除了含有可聚合有机基团的硅化合物之外的玻璃或陶瓷的一种或多种水解可缩聚化合物的化合物水解缩聚 液体反应介质以形成溶胶，并且在光引发剂存在下以结构或非结构化方式照射所得溶胶，所述光引发剂可使用光引发剂吸收的波长范围的辐射在照射时改变反应介质的pH值; 或B）在含有醇，一种或多种水解可缩聚的玻璃或陶瓷组成元素的化合物和光引发剂的无水反应介质中释放水，其可以通过结构化或非结构化的光化学反应或二次反应释放水 使用光引发剂吸收的波长范围的辐射的结构化照射，并且以这种方式进行水解缩聚。

    Silicon and zirconium based lacquer, its use as a substrate coating and substrates thus obtained
    2.
    发明授权
    Silicon and zirconium based lacquer, its use as a substrate coating and substrates thus obtained 失效
    硅和锆基漆，其用作基底涂层和由此获得的底物

    公开(公告)号：US5668237A

    公开(公告)日：1997-09-16

    申请号：US347472

    申请日：1995-02-15

    申请人： Michael Popall ,  Jochen Schulz ,  Birke Olsowski ,  Monika Pilz

    发明人： Michael Popall ,  Jochen Schulz ,  Birke Olsowski ,  Monika Pilz

    IPC分类号： B05D7/26 ,  C08G77/20 ,  C08G77/22 ,  C08G77/58 ,  C08G79/00 ,  C09D183/04 ,  C09D183/07 ,  C09D183/14 ,  C09D185/00 ,  H01B3/46 ,  H01G4/33 ,  H01L23/29 ,  H05K3/28

    CPC分类号： C09D183/14 ,  C08G77/58 ,  H01B3/46 ,  H01L23/29 ,  H01L23/296 ,  H05K3/285 ,  H01L2924/0002

    摘要： The present invention relates to a lacquer obtained by the process comprising the steps of: (i) precondensation of: a) 1 to 10 mol % of at least one zirconium compound of the formula ZrR.sub.4 ; b) 20 to 94 mol % of at least one organic silane of the formula R".sub.m (R'"Y).sub.n SiX.sub.(4-m-n) ; c) 5 to 30 mol % of at least one organic silane of the formula R".sub.p SiX.sub.4-p ; d) optionally 0 to 10 mol % of at least one low-volatility metal oxide; and (ii) hydrolysis condensation of the precondensate of step (i) in the presence of 0 to 50% of the stoichiometric amount of water. The invention also relates to a process for the obtention of a coating on substrate which comprises the steps of applying the lacquer and curing same. The invention also relates to the thus-coated substrates.

    摘要翻译： PCT No.PCT / EP93 / 01427 Sec。 371日期1995年2月15日 102（e）日期1995年2月15日PCT提交1993年6月5日PCT公布。 出版物WO93 / 25605 日本公开日1993年12月23日本发明涉及通过该方法获得的漆，其包括以下步骤：（i）预缩合：a）1至10mol％的至少一种式ZrR 4的锆化合物; b）20-94摩尔％的至少一种式R''m（R“'）nSiX（4-m-n）的有机硅烷; c）5至30mol％的至少一种式R''pSiX4-p的有机硅烷; d）任选的0至10摩尔％的至少一种低挥发性金属氧化物; 和（ii）步骤（i）的预缩合物在0至50％化学计量的水存在下的水解缩合。 本发明还涉及一种用于获得基材上的涂层的方法，该方法包括施加该漆并固化其的步骤。 本发明还涉及如此涂覆的基底。

    Hydrophobic coating for ink jet printing heads
    4.
    发明授权
    Hydrophobic coating for ink jet printing heads 失效
    用于喷墨打印头的疏水涂层

    公开(公告)号：US06283578B1

    公开(公告)日：2001-09-04

    申请号：US09029127

    申请日：1998-06-11

    申请人： Michael Popall ,  Jochen Schulz ,  Birke-E. Olsowski ,  Adelheid Martin ,  Karl Bühler

    发明人： Michael Popall ,  Jochen Schulz ,  Birke-E. Olsowski ,  Adelheid Martin ,  Karl Bühler

    IPC分类号： B41J2135

    CPC分类号： B41J2/1606 ,  C09D183/04 ,  C09D183/06

    摘要： The invention provides inkjet print head which has an Anti-wetting Coating of a polymer material, which is produced with the utilization of at least one Compound (I) XaRbSiR1(4-a-b) with X=hydrolyzable group, R=possibly substituted Alkyl, Aryl, Alkenyl, Alkylaryl or Arylalkyl, R1=organic remainder with at least one polymerizable group, a=to 3, b=0 to 2. In addition, a Process for the Manufacture of the Print Heads is made available, as well as a Means for the Coating of same.

    摘要翻译： 本发明提供喷墨打印头，其具有使用至少一种化合物（I）XaRbSiR1（4-ab）与X =可水解基团，R =可能被取代的烷基取代的聚合物材料的抗潮湿涂层， 芳基，烯基，烷基芳基或芳基烷基，R1 =具有至少一个可聚合基团的有机残基，a = 3，b = 0至2.此外，制造印刷头的方法可用，以及 用于涂层的方法。