专利检索 ap:("Michael ROTHENBERG" OR "Taewook HWANG" OR "Paul CYR" OR "Rachel Z. PYTEL" OR "Ramanujam VEDANTHAM" OR "Srinivasan RAMANATH") AND inv:"Michael ROTHENBERG" 第 1 页

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发明申请
TOOL FOR USE WITH DUAL-SIDED CHEMICAL MECHANICAL PLANARIZATION PAD CONDITIONER 审中-公开
标题翻译：工具与双面化学机械平面平铺调节器一起使用

公开(公告)号：US20130316630A1

公开(公告)日：2013-11-28

申请号：US13886689

申请日：2013-05-03

申请人： Michael ROTHENBERG , Taewook HWANG , Paul CYR , Rachel Z. PYTEL , Ramanujam VEDANTHAM , Srinivasan RAMANATH

发明人： Michael ROTHENBERG , Taewook HWANG , Paul CYR , Rachel Z. PYTEL , Ramanujam VEDANTHAM , Srinivasan RAMANATH

IPC分类号： B24B53/12

CPC分类号： B24B53/12 , B24B53/017

摘要： A tool includes a holder configured to couple to a dual-sided chemical mechanical planarization (CMP) pad conditioner. The holder has a magnetic material, a first magnetic field strength (H1) at a first face, and a second magnetic field strength (H2) at a second face opposite the first face. The first magnetic field strength (H1) is different than the second magnetic field strength (H2).

摘要翻译： 工具包括配置成耦合到双面化学机械平面化（CMP）垫调节器的保持器。保持器具有磁性材料，第一面处的第一磁场强度（H1）和与第一面相对的第二面处的第二磁场强度（H2）。第一磁场强度（H1）不同于第二磁场强度（H2）。