公开(公告)号：US20120199956A1

公开(公告)日：2012-08-09

申请号：US13368028

申请日：2012-02-07

申请人： Monique Lecomte ,  Pascal Guenard ,  Sophie Rigal ,  David Sotta ,  Fabienne Janin ,  Christelle Veytizou

发明人： Monique Lecomte ,  Pascal Guenard ,  Sophie Rigal ,  David Sotta ,  Fabienne Janin ,  Christelle Veytizou

IPC分类号： H01L29/02 ,  H01L21/762 ,  H01L21/02

CPC分类号： H01L21/76254 ,  H01L21/02032

摘要： The present invention relates to process for recycling a source substrate that has a surface region and regions in relief on the surface region, with the regions in relief corresponding to residual regions of a layer of the source substrate that were not being separated from the rest of the source substrate during a prior removal step. The process includes selective electromagnetic irradiation of the source substrate at a wavelength such that the damaged material of the surface region absorbs the electromagnetic irradiation. The present invention also relates to a recycled source substrate and to a process for transferring a layer from a source substrate recycled for this purpose.

摘要翻译： 本发明涉及一种用于再循环源衬底的方法，该源衬底具有表面区域和在表面区域上的浮雕区域，其中缓冲区域对应于源衬底层的剩余区域，其不与其余部分分离 在先前的去除步骤期间的源极衬底。 该方法包括以使得表面区域的损伤材料吸收电磁辐射的波长的源极基板的选择性电磁辐射。 本发明还涉及一种再循环源底物和用于从为此目的回收的源底物转移层的方法。