公开(公告)号：US20130256262A1

公开(公告)日：2013-10-03

申请号：US13663230

申请日：2012-10-29

Applicant: NATIONAL APPLIED RESEARCH LABORATORIES

Inventor： Chien-Nan Hsiao ,  Po-Kai Chiu ,  Da-Ren Liu ,  James Su ,  Fong-Zhi Chen

IPC: B05D3/10

CPC classification number: G01B11/0683 ,  C23C14/221 ,  C23C14/547 ,  C23C14/5873 ,  C23C14/5893 ,  C23C16/45591 ,  H01L22/12 ,  H01L22/26

Abstract: An in situ manufacturing process monitoring system of extreme smooth thin film and method thereof, comprising a coating device for coating a thin film on at least one substrate during a coating process, an ion figuring device for processing a surface polishing process on the thin film, a control device electrically coupled to the coating device and the ion figuring device respectively for controlling the coating device and the ion figuring device processing the coating process and surface polishing process by adjusting at least one device parameter of the coating device and the ion figuring device, and an in situ monitoring device electrically coupled to the control device for in situ monitoring at least one optical parameter of the thin film.

Abstract translation: 一种极端光滑薄膜的原位制造工艺监控系统及其方法，包括在涂覆过程中在至少一个基底上涂覆薄膜的涂层装置，用于处理薄膜上的表面抛光工艺的离子计数装置， 电耦合到涂覆装置和离子计数装置的控制装置，分别用于通过调节涂覆装置和离子计数装置的至少一个装置参数来控制涂覆装置和离子计数装置处理涂布过程和表面抛光工艺， 以及电耦合到控制装置的原位监测装置，用于原位监测薄膜的至少一个光学参数。