TSV Wafer Thinning Controlling Method and System
    1.
    发明申请
    TSV Wafer Thinning Controlling Method and System 审中-公开
    TSV晶圆变薄控制方法与系统

    公开(公告)号:US20150099423A1

    公开(公告)日:2015-04-09

    申请号:US14253484

    申请日:2014-04-15

    IPC分类号: B24B37/013 B24B49/12

    CPC分类号: B24B37/013 B24B49/12

    摘要: A TSV wafer thinning controlling method and system is provided, which can improve the accuracy of the wafer thinning technique. The system includes a chuck table used for carrying a wafer and a grinding device used for thinning the wafer; and further includes: an infrared sensor equipped on the chuck table or grinding device, and a measurement feedback system connected with the infrared sensor and the grinding device; wherein, the infrared sensor comprises an infrared emitting and receiving circuit, signal amplifying and filtering circuit and a data processor.

    摘要翻译: 提供了TSV晶片薄化控制方法和系统,可以提高晶片薄化技术的精度。 该系统包括用于承载晶片的卡盘台和用于使晶片变薄的研磨装置; 并且还包括:配备在卡盘台或研磨装置上的红外传感器,以及与红外传感器和研磨装置连接的测量反馈系统; 其中,所述红外线传感器包括红外发射和接收电路,信号放大和滤波电路以及数据处理器。