公开(公告)号：US11927780B2

公开(公告)日：2024-03-12

申请号：US17828057

申请日：2022-05-31

Applicant: NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Jian-Hung Lin ,  Chiang-Hsin Lin ,  Po-Tse Tai ,  Tsong-Dong Wang ,  Bo-Kai Feng

IPC: G02B5/28 ,  G02B5/18

CPC classification number: G02B5/1809 ,  G02B5/1857 ,  G02B5/285

Abstract: A dielectric grating apparatus comprises a substrate; a grating layer, disposed above the substrate; a first interference layer, disposed above the substrate; and a second interference layer, adjacent to the first interference layer, wherein a refractive index of a material of the second interference layer is greater than a refractive index of a material of the first interference layer.