公开(公告)号：US20210243858A1

公开(公告)日：2021-08-05

申请号：US17052563

申请日：2019-05-24

Applicant: NATIONAL INSTITUTE FOR MATERIALS SCIENCE

Inventor： Tadaaki NAGAO ,  Tung Anh DOAN ,  Duy Thang DAO ,  Satoshi ISHII

IPC: H05B39/00 ,  H05B39/04 ,  H05B3/00

Abstract: Provided is a radiation light source that enables adjustment of infrared radiation to a significantly narrow band. A plasmonic reflector layer consisting of a plasmonic material, a resonator layer consisting of an insulator, and a partially reflecting layer are alternately laminated in this order to form a multi-layered radiation light source, wherein the partially reflecting layer are selected from any one of a free interface, an ultrathin-film metallic layer, and a distributed reflector layer having a structure in which layers having different refractive indexes are alternately laminated. When a material with high-temperature resistance such as SiC is used in the outermost layer of the distributed reflector layer, the multi-layered radiation light source can operate at high temperatures of 550° C. and higher.