公开(公告)号：US20220291153A1

公开(公告)日：2022-09-15

申请号：US17638434

申请日：2020-08-11

Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Inventor： Rikio SODA ,  Kimihiro OZAKI

IPC: G01N23/2055

Abstract: An orientation degree distribution analysis method of the present invention includes steps of: inputting crystal structure information of an object to be measured, information on an intensity ratio of each diffraction peak and a crystal plane corresponding to each diffraction peak by X-ray diffraction measurement, information on a diffraction range and diffraction sensitivity, and an intensity ratio of each diffraction peak of a randomly oriented sample to a main storage device; calculating an angle formed by an orientation plane and a crystal plane corresponding to the diffraction peak of interest from the information stored in the main storage device in the step; calculating an existence ratio and storing the existence ratio in the main storage device; setting an orientation degree distribution function; and calculating an orientation degree distribution from the information of the input step and the calculation step. As a result, there are provided a method of easily calculating an orientation degree distribution from an X-ray diffraction profile by using an information processing apparatus and a calculation program without requiring complicated pretreatment of a sample as in an EBSD method, and a method of obtaining a spatial map of the orientation degree distribution from a plurality of diffraction intensity maps obtained by using a micro-focal X-ray.