Process for fabrication of a liquid crystal display with thin film transistor array free from short-circuit
    1.
    发明申请
    Process for fabrication of a liquid crystal display with thin film transistor array free from short-circuit 有权
    用于制造没有短路的薄膜晶体管阵列的液晶显示器的工艺

    公开(公告)号:US20040160542A1

    公开(公告)日:2004-08-19

    申请号:US10782908

    申请日:2004-02-23

    Inventor: Naoyuki Taguchi

    CPC classification number: H01L27/1248 G02F1/1362 H01L27/124 H01L27/1255

    Abstract: Pixels of a liquid crystal display are laid on a delta pattern, and short-circuit is liable to take place between a source layer and a drain layer and/or between a gate layer and a storage electrode layer, wherein a contact slit is formed in a gate insulating layer intervening between the gate/storage electrode layers and the source/drain layers in such a manner as to break a piece of residual amorphous silicon and make a piece of residual metal exposed thereto, and the piece of residual metal is broken during a patterning step for the source/drain layers.

    Abstract translation: 液晶显示器的像素被放置在三角形图案上,并且容易在源极层和漏极层之间和/或栅极层和存储电极层之间发生短路,其中形成接触狭缝 以栅极/存储电极层和源极/漏极层之间介入的栅极绝缘层,以破坏一块剩余的非晶硅并使一块残留的金属暴露于其中,并且该残余金属片在 用于源极/漏极层的图案化步骤。

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