公开(公告)号：US20240076420A1

公开(公告)日：2024-03-07

申请号：US18263367

申请日：2022-01-18

Applicant: Nagase Chemtex Corporation

Inventor： Koji WATANABE ,  Tatsuya INOUE

IPC: C08F2/48 ,  B29C64/129 ,  B33Y10/00

CPC classification number: C08F2/48 ,  B29C64/129 ,  B33Y10/00 ,  C08F2500/32

Abstract: Provided is a photocurable resin composition including a reactive compound, and a photopolymerization initiator. A cured product of the photocurable resin composition has two or more glass transition points including a TgA and a TgB. The TgA is less than 25° C., and the TgB is 25° C. or more. An elongation at break in accordance with ASTM D638 of the cured product of the photocurable resin composition is 130% or more, and a breaking strength in accordance with ASTM D638 of the cured product of the photocurable resin composition is 3 MPa or more.