Manufacturing Method of Optical Modulator

    公开(公告)号:US20220413211A1

    公开(公告)日:2022-12-29

    申请号:US17772758

    申请日:2019-11-06

    IPC分类号: G02B6/122 G02B6/136

    摘要: Provided is an optical modulator manufacturing method capable of determining the quality of an optical modulator having MMI waveguides and realizing improvement in yield during manufacturing. Here, in waveguide fabrication processes, hard mask material deposition, soft mask material application, exposure, and hard mask fabrication are executed, and then in hard mask width length measurement, the hard mask width for fabricating the MMI waveguide is measured at one or more locations. In hard mask width quality determination based on machine learning results, the quality of optical characteristics of the chip is predicted and determined in advance, based on sample data created in advance by analyzing a relationship between the hard mask width and optical characteristics of the optical modulator, depending on whether the hard mask width is present in a permissible range of the sample data. Depending on the result of the above-mentioned determination the mask fabrication is redone.

    Manufacturing method of optical modulator

    公开(公告)号:US12038603B2

    公开(公告)日:2024-07-16

    申请号:US17772758

    申请日:2019-11-06

    IPC分类号: G02B6/122 G02B6/136

    CPC分类号: G02B6/122 G02B6/136

    摘要: Provided is an optical modulator manufacturing method capable of determining the quality of an optical modulator having MMI waveguides and realizing improvement in yield during manufacturing. Here, in waveguide fabrication processes, hard mask material deposition, soft mask material application, exposure, and hard mask fabrication are executed, and then in hard mask width length measurement, the hard mask width for fabricating the MMI waveguide is measured at one or more locations. In hard mask width quality determination based on machine learning results, the quality of optical characteristics of the chip is predicted and determined in advance, based on sample data created in advance by analyzing a relationship between the hard mask width and optical characteristics of the optical modulator, depending on whether the hard mask width is present in a permissible range of the sample data. Depending on the result of the above-mentioned determination.