公开(公告)号：US20160064198A1

公开(公告)日：2016-03-03

申请号：US14834992

申请日：2015-08-25

Applicant: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

Inventor： Shogo OKITA ,  Bunji MIIZUNO ,  Tomohiro OKUMURA

IPC: H01J37/32

CPC classification number: H01J37/32724 ,  H01J37/321 ,  H01J37/32651 ,  H01J37/32697 ,  H01L21/67092 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68728 ,  H01L21/68742

Abstract: A plasma processing apparatus that performs plasma processing on a substrate held on a transport carrier including an annular frame and a holding sheet. The apparatus includes a process chamber; a process gas supply unit that supplies process gas to the process chamber; a decompressing mechanism that decompresses the process chamber; a plasma excitation device that generates plasma in the process chamber; a stage in the chamber, on which the transport carrier is loaded; a cooling mechanism for cooling the stage; a cover that partly covers the holding sheet and the frame and that has a window section through which the substrate is partly exposed to plasma; a correction member that presses the frame onto the stage and corrects warpage of the frame; and a movement device that moves the correction member. The correction member is provided separately from the cover to be covered by the cover.

Abstract translation: 一种等离子体处理装置，其在保持在包括环形框架和保持片材的运送载体上的基板上进行等离子体处理。 该装置包括处理室; 处理气体供给单元，其将处理气体供给到处理室; 减压处理室的减压机构; 在处理室中产生等离子体的等离子体激发装置; 运输承运人在该舱的一个阶段; 用于冷却载物台的冷却机构; 部分地覆盖保持片和框架并且具有窗口部分的盖子，衬底部分地暴露于等离子体; 校正构件，其将框架按压到台架上并校正框架的翘曲; 以及使校正构件移动的移动装置。 修正构件与盖子分开设置以被盖覆盖。