Plant cultivation apparatus
    1.
    发明授权

    公开(公告)号:US10085385B2

    公开(公告)日:2018-10-02

    申请号:US15072841

    申请日:2016-03-17

    Abstract: A plant cultivation apparatus of the present disclosure includes a first light source unit configured to include a first laser diode radiating a first light beam, and a first scanning mechanism scanning the first light beam and forming a first radiation region, a second light source unit configured to include a second laser diode radiating a second light beam, and a second scanning mechanism scanning the second light beam and forming a second radiation region, and a signal processor configured to control the first light source unit and the second light source unit. A wavelength of the first light beam is the same as a wavelength of the second light beam. The signal processor forms a multiple radiation region by causing the first radiation region and the second radiation region to overlap each other.

Patent Agency Ranking