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公开(公告)号:US10220107B2
公开(公告)日:2019-03-05
申请号:US15464877
申请日:2017-03-21
Inventor: Minoru Egawa , Yoshihiro Sakaguchi
IPC: A61L2/14 , H01J37/32 , C02F1/46 , C02F1/467 , C02F101/30
Abstract: A plasma generating method, used in a plasma generating apparatus which includes a container, a first electrode, and a second electrode, includes: supplying a liquid in the container so that the second electrode is in contact with the liquid; in a first period, generating first plasma in a bubble generated in the liquid by applying a first voltage between the first electrode and the second electrode; supplying a first gas in the liquid in a second period after the first period; and generating second plasma in the first gas by applying a second voltage between the first electrode and the second electrode. In generating the first plasma, the first gas is not supplied in the liquid. The bubble contains a second gas.
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公开(公告)号:US10446375B2
公开(公告)日:2019-10-15
申请号:US15900994
申请日:2018-02-21
Inventor: Minoru Egawa
Abstract: A liquid processing apparatus includes a container for holding liquid, a first electrode, a second electrode, a first insulator that has a cylindrical shape and at least partly surrounds a side face of the first electrode via a space, the first insulator having an opening in an end face of the first insulator, a gas supply device that supplies gas into the space and releases the gas into the liquid via the opening, a power source that applies a voltage between the first electrode and the second electrode and generates plasma, and a metallic member that partly surrounds the side face of the first electrode via the space. The metallic member is electrically connected to the first electrode. At least a part of the first insulator is disposed between the first electrode and the metallic member.
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