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公开(公告)号：US07413616B2
公开(公告)日：2008-08-19
申请号：US11582694
申请日：2006-10-19
CPC分类号： B08B3/04 , Y10S134/902
摘要： An active rinse shield designed to protect electrofill chemical baths from excessive dilution during rinse sprays on the semiconductor wafer. The shield uses overlapping blades to cover the bath, making a physical barrier between the bath chemistry and the wafer rinse water. The blades are interconnecting ribs that actuate around a common pivot axis. A linear mechanical actuator controls the blade movement, moving the top-most blade, which in turn, moves an adjacent lower blade. Each upper blade is interconnected to an adjacent lower blade by upper and lower ledges, a pivot boss and interlocking cut, and a curved ledge on each blade's body surface. The interconnecting features allow the blades to move one another out for extension or in for retraction. The interlocking blades are inclined above one another, forming grooves to redirect the rinse water away from the chemical bath.
摘要翻译： 主动冲洗护罩设计用于在半导体晶片上冲洗喷雾时保护电解液化学浴液免受过度稀释。 屏蔽层使用重叠的刀片覆盖浴缸，从而在洗浴化学品和晶片冲洗水之间形成物理屏障。 叶片是互相连接的肋，其围绕共同的枢转轴线致动。 线性机械致动器控制刀片运动，移动最顶端的刀片，而刀片运动又相邻的下刀片。 每个上部刀片通过上部和下部凸缘，枢轴凸台和互锁切口以及每个刀片的车身表面上的弯曲凸缘互连到相邻的下部刀片。 互连功能允许刀片彼此移动以进行扩展或缩回。 互锁叶片彼此倾斜，形成凹槽以将冲洗水重新排列离开化学浴。
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公开(公告)号：US07146994B2
公开(公告)日：2006-12-12
申请号：US10390373
申请日：2003-03-17
IPC分类号： B08B15/02
CPC分类号： B08B3/04 , Y10S134/902
摘要： An active rinse shield designed to protect electrofill chemical baths from excessive dilution during rinse sprays on the semiconductor wafer. The shield uses overlapping blades to cover the bath, making a physical barrier between the bath chemistry and the wafer rinse water. The blades are interconnecting ribs that actuate around a common pivot axis. A linear mechanical actuator controls the blade movement, moving the top-most blade, which in turn, moves an adjacent lower blade. Each upper blade is interconnected to an adjacent lower blade by upper and lower ledges, a pivot boss and interlocking cut, and a curved ledge on each blade's body surface. The interconnecting features allow the blades to move one another out for extension or in for retraction. The interlocking blades are inclined above one another, forming grooves to redirect the rinse water away from the chemical bath.
摘要翻译： 主动冲洗护罩设计用于在半导体晶片上冲洗喷雾时保护电解液化学浴液免受过度稀释。 屏蔽层使用重叠的刀片覆盖浴缸，从而在洗浴化学品和晶片冲洗水之间形成物理屏障。 叶片是互相连接的肋，其围绕共同的枢转轴线致动。 线性机械致动器控制刀片运动，移动最顶端的刀片，而刀片运动又相邻的下刀片。 每个上部刀片通过上部和下部凸缘，枢轴凸台和互锁切口以及每个刀片的车身表面上的弯曲凸缘互连到相邻的下部刀片。 互连功能允许刀片彼此移动以进行扩展或缩回。 互锁叶片彼此倾斜，形成凹槽以将冲洗水重新排列离开化学浴。
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