摘要:
An improved process for supplying to a processing apparatus a gas containing at least one impurity that reacts and/or nucleates to form contaminating particles suspended in the gas is disclosed. The improvement includes sampling a flow of the gas upstream of the processing apparatus with a particle counter and/or particle capture filter to detect an amount of the contaminating particles in the flow of the gas, and generating a signal when the amount of particles is in excess of a predetermined amount. An apparatus for performing the process includes: a supply source; at least one processing tool; a particle counter upstream of the processing tool and downstream of the supply source; a microprocessor in electrical communication with at least the particle counter; and optionally a particle capture filter in parallel with the particle counter. The process and apparatus are useful in the manufacture of integrated circuits.