公开(公告)号：US20210095112A1

公开(公告)日：2021-04-01

申请号：US17051919

申请日：2019-04-24

Applicant: Polyplastics Co., Ltd.

Inventor： Hiroki Arai ,  Tornohiro MONMA

IPC: C08L59/04 ,  C08K3/22 ,  C08K5/00 ,  C08K5/13 ,  C08L71/02 ,  F02M59/44

Abstract: A polyacetal resin composition capable of minimizing degradation when a molded body thereof comes into contact with an acidic cleaner. The polyacetal resin composition contains with respect to (A) 100 parts by mass of a polyacetal copolymer in which the amount of a hemiformal end group is 0.8 mmol/kg or less, (B) more than 1.0 parts by mass and at most 5.0 parts by mass of a hindered phenol-based antioxidant, and (C) more than 4.0 parts by mass and at most 30 parts by mass of magnesium oxide.