Apparatus, Method and System for Measuring the Influence of Ophthalmic Lens Design

    公开(公告)号:US20200081269A1

    公开(公告)日:2020-03-12

    申请号:US16493948

    申请日:2018-03-15

    Abstract: A method for measuring an influence of an ophthalmic lens design is disclosed. The method comprises splitting an optical light beam into a wavefront measurement light path and a wavefront modulation light path; implementing the ophthalmic lens design in an adaptive optics device positioned in the wavefront modulation light path; and obtaining ocular biometric data in the ocular biometric and wavefront measurement light path to measure the influence of the ophthalmic lens design. Also disclosed are an apparatus and a system for measuring an influence of an ophthalmic lens design along with a method for assembling the device and system. The ocular biometric device may be an interferometer and the adaptive optics device may comprise one or more wavefront shapers.

Patent Agency Ranking