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公开(公告)号：US20250073842A1
公开(公告)日：2025-03-06
申请号：US18710642
申请日：2023-09-03
Applicant: Rajeev BAJAJ , Ananth NAMAN
Inventor： Rajeev BAJAJ , Ananth NAMAN
Abstract: A polishing pad comprising a textile layer, a compressible layer, and a water impermeable layer disposed between the textile layer and the compressible layer. The polishing pad reduces slurry use by improving slurry transport and requires no diamond conditioning to maintain slurry transport.
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