公开(公告)号：US20050185338A1

公开(公告)日：2005-08-25

申请号：US10785236

申请日：2004-02-23

申请人： Richard Hsiao ,  Wipul Jayaekara ,  Jeffrey Lille

发明人： Richard Hsiao ,  Wipul Jayaekara ,  Jeffrey Lille

IPC分类号： B24B1/00 ,  G11B5/127 ,  G11B5/147 ,  G11B5/187 ,  G11B5/265

CPC分类号： G11B5/1278 ,  Y10T29/49021

摘要： A method for forming a magnetic structure, such as a pole tip, includes forming a pole tip layer of magnetic material. A layer of polyimide precursor material is added above the pole tip layer and cured. A silicon-containing resist layer is added above the layer of polyimide precursor material and patterned. The resist layer is exposed to oxygen plasma for converting the resist into a glass-like material. Exposed portions of the cured polyimide precursor material are removed for exposing portions of the pole tip layer. The exposed portions of the pole tip layer are removed for forming a pole tip. Chemical mechanical polishing (CMP) can then be performed to remove any unwanted material remaining above the pole tip.

摘要翻译： 用于形成诸如极尖的磁性结构的方法包括形成磁性材料的磁极尖端层。 将一层聚酰亚胺前体材料添加到极尖层上方并固化。 将含硅抗蚀剂层添加到聚酰亚胺前体材料层上方并图案化。 将抗蚀剂层暴露于氧等离子体以将抗蚀剂转化为玻璃状材料。 去除固化的聚酰亚胺前体材料的暴露部分以暴露极尖层的部分。 去除极尖端部的暴露部分以形成极尖。 然后可以进行化学机械抛光（CMP）以除去残留在极尖顶部的任何不需要的材料。