专利检索 ap:("Rob Adrianus Antonius Maria Bastiaensen" OR "Marcel Maurice Hemerik" OR "Marcus Adrianus Van De Kerkhof" OR "Jeroen Johannes Sophia Maria Mertens" OR "Jacob Sonneveld") AND inv:"Rob Adrianus Antonius Maria Bastiaensen" 第 1 页

1.

发明授权
Sensor and lithographic apparatus 失效
标题翻译：传感器和光刻设备

公开(公告)号：US07459669B2

公开(公告)日：2008-12-02

申请号：US11321466

申请日：2005-12-30

申请人： Rob Adrianus Antonius Maria Bastiaensen , Marcel Maurice Hemerik , Marcus Adrianus Van De Kerkhof , Jeroen Johannes Sophia Maria Mertens , Jacob Sonneveld

发明人： Rob Adrianus Antonius Maria Bastiaensen , Marcel Maurice Hemerik , Marcus Adrianus Van De Kerkhof , Jeroen Johannes Sophia Maria Mertens , Jacob Sonneveld

IPC分类号： G03B27/42 , G03F7/20

CPC分类号： G03F7/70341 , G01N21/85 , G03F7/70591 , G03F7/706

摘要： A sensor for use in a lithographic apparatus, the sensor having a liquid to prevent optical losses, especially when receiving radiation with a high NA. The liquid is fixed between two surfaces by capillary forces in an area through which radiation passes.

摘要翻译： 一种用于光刻设备的传感器，该传感器具有防止光损耗的液体，特别是当接收到具有高NA的辐射时。液体通过辐射通过的区域中的毛细管力固定在两个表面之间。