Apparatus and method to passivate magnets and magnetic materials
    2.
    发明授权
    Apparatus and method to passivate magnets and magnetic materials 失效
    钝化磁体和磁性材料的装置和方法

    公开(公告)号:US06540839B1

    公开(公告)日:2003-04-01

    申请号:US09820550

    申请日:2001-03-29

    IPC分类号: C23C1600

    CPC分类号: C23C16/442 H01F41/026

    摘要: An apparatus and method is provided for uniformly coating a magnet having a plurality of surfaces and includes a reaction chamber having a port for introducing the magnet into the reaction chamber. A heater is also included for heating the reaction chamber. Also, a carrier gas port is in fluid communications with the reaction chamber for introducing a carrier gas into the reaction chamber. In addition, a reactant gas port is in fluid communications with the reaction chamber for introducing a reactant gas into the reaction chamber. When the magnet and the carrier gas are introduced into the reaction chamber, the magnet becomes suspended in the reaction chamber. Also, when the reactant gas is introduced into the reaction chamber, the reactant gas causes all of the plurality of surfaces of the magnet to be uniformly coated.

    摘要翻译: 提供了一种用于均匀涂覆具有多个表面的磁体的装置和方法,并且包括具有用于将磁体引入反应室的端口的反应室。 还包括用于加热反应室的加热器。 此外,载气端口与反应室流体连通,用于将载气引入反应室。 此外,反应物气体端口与反应室流体连通,用于将反应气体引入反应室。 当磁体和载气被引入到反应室中时,磁体悬浮在反应室中。 此外,当将反应气体引入反应室时,反应气体使得磁体的所有多个表面均匀地被涂覆。

    Structure and fabrication process for integrated moving-coil magnetic micro-actuator
    3.
    发明授权
    Structure and fabrication process for integrated moving-coil magnetic micro-actuator 有权
    集成式动圈式磁性微型执行器的结构和制造工艺

    公开(公告)号:US06661617B1

    公开(公告)日:2003-12-09

    申请号:US09657884

    申请日:2000-09-08

    IPC分类号: G11B548

    CPC分类号: G11B5/4826 G11B5/5552

    摘要: A moving-coil magnetic microactuator is formed by using a dual silicon wafer structure and thin film technologies such as deep trench reactive ion etching, reactive ion etching, plasma-enhanced chemical vapor deposition and metallo-organinc chemical vapor deposition. Several bottom structures are formed from a bottom wafer, each bottom structure having a coil and wires embedded in the surface of the bottom structure. Several top structures are formed from a top wafer, each top structure having a magnet and mechanical stand-offs. The top structures are bonded to the bottom structures so that the magnet is above the embedded coil, separated by an air gap created by the mechanical stand-offs.

    摘要翻译: 通过使用双硅晶片结构和诸如深沟槽反应离子蚀刻,反应离子蚀刻,等离子体增强化学气相沉积和金属有机化学气相沉积的薄膜技术形成动圈式磁微型致动器。 从底部晶片形成多个底部结构,每个底部结构具有线圈和嵌入在底部结构的表面中的电线。 从顶部晶片形成几个顶部结构,每个顶部结构具有磁体和机械支座。 顶部结构结合到底部结构,使得磁体在嵌入式线圈上方,由机械支座产生的空气间隙分开。