公开(公告)号：US06507033B1

公开(公告)日：2003-01-14

申请号：US09280231

申请日：1999-03-29

申请人： Ronald G. Musket ,  Robert G. Patterson

发明人： Ronald G. Musket ,  Robert G. Patterson

IPC分类号： H01J37317

CPC分类号： H01J37/244 ,  H01J2237/24405 ,  H01J2237/31701

摘要： An improved Faraday cup array for determining the dose of ions delivered to a substrate during ion implantation and for monitoring the uniformity of the dose delivered to the substrate. The improved Faraday cup array incorporates a variable size ion beam aperture by changing only an insertable plate that defines the aperture without changing the position of the Faraday cups which are positioned for the operation of the largest ion beam aperture. The design enables the dose sensitivity range, typically 1011-1018 ions/cm2 to be extended to below 106 ions/cm2. The insertable plate/aperture arrangement is structurally simple and enables scaling to aperture areas between 750 cm2, and enables ultra-high vacuum (UHV) applications by incorporation of UHV-compatible materials.

摘要翻译： 改进的法拉第杯阵列，用于确定离子注入期间输送到基底的离子的剂量，并用于监测递送至基底的剂量的均匀性。 改进的法拉第杯阵列通过仅改变限定孔径的可插入板而不改变为最大离子束孔径的操作定位的法拉第杯的位置而包括可变尺寸的离子束孔径。 该设计使得剂量敏感性范围通常为1011-1018个离子/ cm 2可以延伸到低于106个离子/ cm 2。 可插入板/孔布置在结构上是简单的，并且能够缩小到<1cm 2和> 750cm 2之间的孔径区域，并且通过结合UHV兼容材料能够实现超高真空（UHV）应用。