公开(公告)号：US5084262A

公开(公告)日：1992-01-28

申请号：US473263

申请日：1990-01-31

申请人： Rudolf Novotny ,  Alfred Hoff ,  Jost Schuertz

发明人： Rudolf Novotny ,  Alfred Hoff ,  Jost Schuertz

IPC分类号： C01B33/32

CPC分类号： C01B33/32

摘要： The direct hydrothermal production of high purity potassium silicate solutions having a high SiO.sub.2 : K.sub.2 O molar ratio by reaction of a silicon dioxide source with aqueous potassium hydroxide solutions is made possible by using a silicon dioxide source that contains a sufficient fraction of cristobalite phase, or by conditioning other crystalline forms of silicon dioxide by heating at or above 1100.degree. C., but below the melting point of silica, before the hydrothermal treatment. Preferably the potassium hydroxide solution has a concentration range of 10 to 40% by weight, and the reaction is carried out in a closed pressure reactor at temperatures of 150.degree. to 300.degree. C. and under saturated steam pressures corresponding to those temperatures.

摘要翻译： 通过二氧化硅源与氢氧化钾水溶液的反应，通过二氧化硅源与氢氧化钾水溶液的反应，可以直接水热生产具有高二氧化硅：K 2 O摩尔比的高纯度硅酸钾溶液。通过使用含有足够部分方英石相的二氧化硅源，或通过 在水热处理之前通过在1100℃以上加热但低于二氧化硅的熔点来调节其它结晶形式的二氧化硅。 优选地，氢氧化钾溶液的浓度范围为10〜40重量％，反应在150℃〜300℃的密闭压力反应器中进行，在对应于这些温度的饱和蒸气压下进行。

公开(公告)号：US5238668A

公开(公告)日：1993-08-24

申请号：US859422

申请日：1992-05-26

申请人： Rudolf Novotny ,  Alfred Hoff ,  Jost Schuertz

发明人： Rudolf Novotny ,  Alfred Hoff ,  Jost Schuertz

IPC分类号： C01B33/32

CPC分类号： C01B33/32

摘要： A process is disclosed for the hydrothermal production of potassium silicate solutions with high SiO.sub.2 :K.sub.2 O molar ratios, by the hydrothermal reaction of quartz sand with aqueous potassium hydroxide solutions at temperatures in the range of 150.degree. to 300.degree. C. at the pressures of saturated water vapor corresponding to these temperatures in a pressure reactor, which is characterized in that the potassium silicate solutions obtained thereby, which have SiO.sub.2 :K.sub.2 O molar ratios of less than 2.75:1, are then reacted with a quartz tempered at temperatures in the range of over 1100.degree. C. up to melting point, the temperatures and pressures also being maintained in the ranges named.

摘要翻译： PCT No.PCT / EP90 / 01948 Sec。 371日期：1992年5月26日 102（e）日期1992年5月26日PCT提交1990年11月14日PCT公布。 出版物WO91 / 08170 日期：1991年6月13日。公开了通过石英砂与氢氧化钾水溶液在150℃至300℃的温度范围内的水热反应，以高SiO 2：K 2 O摩尔比水热生产硅酸钾溶液的方法 C.在压力反应器中对应于这些温度的饱和水蒸气的压力下，其特征在于由SiO 2 :K 2 O摩尔比小于2.75:1获得的由此获得的硅酸钾溶液与石英 在超过1100℃的温度范围内回火至熔点，温度和压力也保持在所述范围内。

公开(公告)号：US5000933A

公开(公告)日：1991-03-19

申请号：US472980

申请日：1990-01-31

申请人： Rudolf Novotny ,  Alfred Hoff ,  Jost Schuertz

发明人： Rudolf Novotny ,  Alfred Hoff ,  Jost Schuertz

IPC分类号： C01B33/32

CPC分类号： C01B33/32

摘要： The direct hydrothermal production of high purity sodium silicate solutions having a high SiO.sub.2 : Na.sub.2 O molar ratio by reaction of a silicon dioxide source with aqueous sodium hydroxide solutions, or with aqueous sodium silicate solutions having a lower SiO.sub.2 : Na.sub.2 O molar ratio, is made possible by using a silicon dioxide source that contains a sufficient fraction of cristobalite phase, or by conditioning other crystalline forms of silicon dioxide by heating at or above 1100.degree. C., but below the melting point of silica, before the hydrothermal treatment. Preferably the sodium hydroxide solution has a concentration range of 10 to 50% by weight, and the reaction is carried out in a closed pressure reactor at temperatures of 150.degree. to 300.degree. C. and under saturated steam pressures corresponding to those temperatures.

摘要翻译： 通过二氧化硅源与氢氧化钠水溶液的反应或SiO 2 :Na 2 O摩尔比较低的硅酸钠水溶液的反应，可以直接水热生产具有高SiO 2 :Na 2 O摩尔比的高纯度硅酸钠溶液。 或者通过在水热处理前1100℃以上或低于二氧化硅熔点进行加热处理其它结晶形式的二氧化硅，使二氧化硅源含有足够的方英石分数。 优选氢氧化钠溶液的浓度范围为10〜50重量％，反应在150℃〜300℃的密闭压力反应器中进行，在相当于这些温度的饱和蒸气压下进行。