公开(公告)号：US20240368757A1

公开(公告)日：2024-11-07

申请号：US18684972

申请日：2022-08-10

Applicant: SAFRAN CERAMICS

Inventor： Arnaud DELEHOUZE ,  Rémi Pierre Robert BOUVIER ,  Manon FERNANDEZ

IPC: C23C16/442 ,  C23C16/34 ,  C23C16/44

Abstract: A device for fluidised bed chemical vapour deposition, includes a reactor including a treatment zone in which the fluidised bed chemical vapour deposition is intended to be carried out using at least a first and a second reactive gas and a diffuser under the treatment zone delimiting the reactor, and a heating system configured to heat at least the treatment zone. The device includes a first channel for introducing the first reactive gas and a second channel for introducing the second reactive gas, which second channel is separate from the first channel and opens out under the diffuser, and wherein the first introduction channel is capable of being moved with respect to the heating system.