公开(公告)号：US10480076B2

公开(公告)日：2019-11-19

申请号：US15049162

申请日：2016-02-22

申请人： SAMSUNG DISPLAY CO., LTD.

发明人： Jai Hyuk Choi ,  Won Woong Park ,  Sung Hun Key ,  Min Soo Kim ,  Byeong Chun Lee ,  Suk Won Jung ,  Hyun Woo Joo ,  Myung Soo Huh

IPC分类号： C23C16/04 ,  C23C16/50 ,  H01L21/02 ,  H01J37/32

摘要： A plasma enhanced chemical vapor deposition (PECVD) apparatus including a chamber; an upper electrode in the chamber; a spray unit in the upper electrode to spray a gas introduced from outside the chamber toward a substrate inside the chamber; a susceptor on which the substrate is mountable; a plurality of mask supports in a mask frame at an edge of the susceptor, the mask supports being formed of a conductive material that provides elastic force by supporting a mask to maintain and control a level of the mask; and a power supply unit to supply power to the upper electrode.