SUBSTRATE PROCESSING APPARATUS
    1.
    发明申请

    公开(公告)号:US20210296153A1

    公开(公告)日:2021-09-23

    申请号:US17189392

    申请日:2021-03-02

    Abstract: A substrate processing apparatus including an electrostatic chuck on which a substrate is mountable; a ring surrounding the electrostatic chuck, the ring including a first coupling groove; and a first floating electrode in the first coupling groove of the ring, the first floating electrode having a ring shape, wherein a top surface of the first floating electrode is exposed at the ring, and the first floating electrode has a tapered shape including an inclined surface that is inclined in a downward direction toward the electrostatic chuck.

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