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公开(公告)号:US20210262081A1
公开(公告)日:2021-08-26
申请号:US16920913
申请日:2020-07-06
发明人: Minsung Lee , Youngkwan Cha , Yountaek Ryu , Kyungwoo Park , Woonyoung Choi , Ducksu Kim , Jeongyub Lee , Changseung Lee
摘要: A deposition apparatus forms a material layer on a substrate in a deposition chamber. Provided in the deposition chamber are at least one deposition material providing device that provides a deposition material to the substrate, a deposition mask that defines a deposition area on the substrate, and a stage that supports the substrate. The stage is movable in X and Y directions in a plane parallel to the substrate.