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公开(公告)号：US11282678B2
公开(公告)日：2022-03-22
申请号：US16535801
申请日：2019-08-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Dong-Hyeon Na , Seung-Bo Shim , Ha-Dong Jin , Min-Young Hur , Kyo-Hyeok Kim , Jong-Woo Sun , Jae-Hyun Lee
Abstract: According to a method of controlling uniformity of plasma, a first RF driving pulse signal including first RF pulses is generated by pulsing a first RF signal having a first frequency, and a second RF driving pulse signal including second RF pulses is generated by pulsing a second RF signal having a second, lower frequency. The first and second RF driving signals are applied to a top electrode and/or a bottom electrode of a plasma chamber. A harmonic control signal including harmonic control pulses is generated based on timing of the first and second RF pulses. A harmonic component of the first and second RF driving pulse signals is reduced via intermittent activation and deactivation of a harmonic control circuit as controlled by the harmonic control signal. The uniformity of plasma is improved through the control based on timings of the RF driving pulses.
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公开(公告)号：US20200227240A1
公开(公告)日：2020-07-16
申请号：US16535801
申请日：2019-08-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： DONG-HYEON NA , Seung-Bo Shim , Ha-Dong Jin , Min-Young Hur , Kyo-Hyeok Kim , Jong-Woo Sun , Jae-Hyun Lee
Abstract: According to a method of controlling uniformity of plasma, a first RF driving pulse signal including first RF pulses is generated by pulsing a first RF signal having a first frequency, and a second RF driving pulse signal including second RF pulses is generated by pulsing a second RF signal having a second, lower frequency. The first and second RF driving signals are applied to a top electrode and/or a bottom electrode of a plasma chamber. A harmonic control signal including harmonic control pulses is generated based on timing of the first and second RF pulses. A harmonic component of the first and second RF driving pulse signals is reduced via intermittent activation and deactivation of a harmonic control circuit as controlled by the harmonic control signal. The uniformity of plasma is improved through the control based on timings of the RF driving pulses.
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