公开(公告)号：US12046464B2

公开(公告)日：2024-07-23

申请号：US17719561

申请日：2022-04-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ga Young Song ,  Mi Hyun Park ,  Jong Kyoung Park ,  Jung Youl Lee ,  Hyun Jin Kim ,  Hyo San Lee ,  Han Sol Lim ,  Hoon Han

IPC: C11D1/00 ,  C11D3/20 ,  C11D3/37 ,  H01L21/02

CPC classification number: H01L21/02041 ,  C11D3/2003 ,  C11D3/2079 ,  C11D3/3749

Abstract: A substrate cleaning composition, a method of cleaning a substrate using the same, and a method of fabricating a semiconductor device using the same, the substrate cleaning composition including a styrene copolymer including a first repeating unit represented by Formula 1-1a and a second repeating unit represented by Formula 1-1b; an additive represented by Formula 2-1; and an alcoholic solvent having a solubility of 500 g/L or less in deionized water,