公开(公告)号：US20220195603A1

公开(公告)日：2022-06-23

申请号：US17386667

申请日：2021-07-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jungjoon PYEON ,  Seoyoung MAENG ,  Iljun JEON ,  Suji GIM ,  Youngseok ROH ,  Jongyong BAE

IPC: C23C16/52 ,  C23C16/455 ,  B01J4/00

Abstract: A reaction gas supply system includes a reaction chamber configured to process a substrate using a reaction gas, a mass flow controller (MFC) configured to control an amount of the reaction gas supplied to the reaction chamber, a tank between the reaction chamber and the MFC, the tank having a cylindrical inner space configured to store the reaction gas, and an outlet portion configured to discharge the reaction gas from the tank, and a valve between the tank and the reaction chamber, the outlet portion of the tank having a gradually decreasing diameter toward the valve.