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1.
公开(公告)号:US20200072874A1
公开(公告)日:2020-03-05
申请号:US16261175
申请日:2019-01-29
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: YOUNG DO KIM , SUNG YONG LIM , CHAN SOO KANG , DO HOON KWON , MIN JU KIM , SANG KI NAM , JUNG MO YANG , JONG HUN PI , KYU HEE HAN
Abstract: An RF sensing apparatus configured for use with a plasma processing chamber includes a penetration unit opened in an up/down direction, a main return path unit surrounding all or a portion of the penetration unit, and a secondary return path unit located between the penetration unit and the main return path unit, spaced apart from the main return path unit, and surrounding all or a portion of the penetration unit. The main return path unit and the secondary return path unit include a path through which a current flows in one of the up/down directions.
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公开(公告)号:US20230377857A1
公开(公告)日:2023-11-23
申请号:US18105918
申请日:2023-02-06
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: SE JIN OH , YEONG KWANG LEE , JONG HUN PI , JUNG MIN KO , DOUG YONG SUNG
CPC classification number: H01J37/32972 , G01J3/021 , G01J3/0208 , G01J3/0291
Abstract: A plasma processing apparatus includes; a housing including a first side wall and a second side wall, wherein the housing defines a processing region in which plasma is generated, an optical source unit disposed on the first side wall in alignment with the viewing window, wherein the optical source unit is configured to irradiate the processing region with incident light through the viewing window, a reflector disposed on the second side wall of the housing, wherein the reflector reflects a portion of the incident light irradiating the processing region to generate reflected light, a spectrometer configured to receive the reflected light from the reflector through the viewing window and the optical source unit and a controller configured to determine density of the active species gas within the processing region in relation to the incident light and the reflected light.
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