专利检索 ap:("SAMSUNG ELECTRONICS CO., LTD.") AND inv:"Jin Goo PARK" 第 1 页

1.

发明公开
PELLICLE CLEANING APPARATUS AND PELLICLE CLEANING METHOD USING THE SAME 审中-公开

公开(公告)号：US20230205078A1

公开(公告)日：2023-06-29

申请号：US17889472

申请日：2022-08-17

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Byunghoon LEE , Jin Goo PARK , Tae-Gon KIM , Sanguk PARK , Changyoung JEONG , Jinho AHN

IPC分类号： G03F1/82 , G03F7/20 , B08B7/00 , B08B11/02 , B08B13/00

CPC分类号： G03F1/82 , G03F7/70925 , B08B7/0028 , B08B11/02 , B08B13/00

摘要： A pellicle cleaning apparatus includes a stage to support a pellicle, a particle remover above the stage, the particle remover being configured to remove a particle from a first surface of a pellicle, and the particle remover including a cantilever, and an adhesive material on a bottom surface of the cantilever, and a pressure controller adjacent to the stage, the pressure controller being configured to control a pressure of a fluid on a second surface of the pellicle.