公开(公告)号：US20210301388A1

公开(公告)日：2021-09-30

申请号：US17037934

申请日：2020-09-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sunhye HWANG ,  Wonwoong CHUNG ,  Younjoung CHO ,  Youngha SONG ,  Yonghun SHIN ,  Byungkil LEE ,  Sungdo LEE ,  Jinhee LEE

IPC: C23C14/24 ,  C23C16/455 ,  F17C1/14

Abstract: A deposition system and a gas storage device, the deposition system including a process chamber; and a gas supply outside of the process chamber, the gas supply being configured to provide monochlorosilane, wherein the gas supply includes a cabinet; and a gas container inside the cabinet, and the gas container includes aluminum (Al).