Integrated circuit device including metal-oxide semiconductor transistors

    公开(公告)号:US12224282B2

    公开(公告)日:2025-02-11

    申请号:US18198496

    申请日:2023-05-17

    Abstract: An integrated circuit device including an active region; an active cutting region at a side of the active region in a first direction; a fin active pattern extending on the active region in the first direction, the fin active pattern including a source region and a drain region; a gate pattern extending across the active region and the fin active pattern in a second direction perpendicular to the first direction, the gate pattern not being in the active cutting region; and an isolated gate contact region in contact with the gate pattern outside of the active region.

Patent Agency Ranking