公开(公告)号：US10020234B2

公开(公告)日：2018-07-10

申请号：US15233643

申请日：2016-08-10

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Young-Jin Noh ,  Jung-Sub Lee ,  Sung-Mo Gu

IPC: H01L21/66 ,  H01L27/12

CPC classification number: H01L22/12 ,  H01L22/20 ,  H01L27/1259

Abstract: A method for fabricating a substrate includes forming a first substrate including a thin film transistor array, and inspecting a first surface of an inspecting device, wherein inspecting the first surface of the inspection device includes: generating first measurement data by detecting a first measurement light that is parallel to a surface of an inspection region in the first surface, generating second measurement data by detecting a second measurement light that is parallel to the surface of the inspection region, and inspecting a state of a surface of the inspection region by comparing the first measurement data with the second measurement data.