公开(公告)号：US20180002808A1

公开(公告)日：2018-01-04

申请号：US15485433

申请日：2017-04-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Suk Jin CHUNG ,  Jong Cheol LEE ,  Jae chul SHIN ,  Min Hwa JUNG ,  Jin Pil HEO

IPC: C23C16/458 ,  C23C16/455 ,  H01L21/02 ,  H01L21/687

Abstract: A gas supply unit includes a base plate, a plurality of gas supply regions protruding from the base plate, the plurality of gas supply regions being arranged on the base plate in a circumferential direction, and a plurality of sidewall trenches defined by facing sidewalls of adjacent gas supply regions of the plurality of gas supply regions, wherein each of the plurality of sidewall trenches has a depth that decreases in a radial direction from a center of the base plate.