公开(公告)号：US20190113847A1

公开(公告)日：2019-04-18

申请号：US16029187

申请日：2018-07-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sung-Min AHN ,  Ja-Yul KIM ,  Sang-Ha PARK ,  Sang-Hyun PARK ,  Sang-Su YEH

IPC: G03F7/20 ,  G02B26/08

Abstract: In a method of controlling an exposure apparatus, a plurality of spot beams is irradiated from an optical system onto a reference surface. Focal positions of at least some spot beams of the plurality of spot beams on Z axis perpendicular to the reference surface are obtained. A focal plane of the at least some spot beams is calculated from the focal positions. An angle of the optical system relative to the reference surface is aligned based on an angle error between the focal plane and the reference surface.