公开(公告)号：US20210156031A1

公开(公告)日：2021-05-27

申请号：US16932194

申请日：2020-07-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sungyong PARK ,  Mitsuaki KOMINO ,  Kyungwon KANG ,  Wonguk SEO ,  Sunggwang LEE ,  Sunghwan LEE

IPC: C23C16/52 ,  C23C16/56 ,  G03F7/16

Abstract: An apparatus for processing a substrate may include a mixture bath, a plurality of reaction chambers and a control module. The mixture bath may be configured to receive a plurality of chemicals to form a mixture. Each of the reaction chambers may be configured to receive a respective substrate of a plurality of the substrates to be processed by the mixture. The control module may be configured to control supply of the mixture supplied from the mixing bath to the reaction chambers with a uniform concentration.