公开(公告)号：US20250060276A1

公开(公告)日：2025-02-20

申请号：US18651417

申请日：2024-04-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yeeun Park ,  Seungwoo Lee ,  Taejoong Kim ,  Jinwoo Ahn ,  Seoyeon Jeong ,  Taeyong Jo

IPC: G01M11/02

Abstract: An optical measurement system includes a hemispherical mirror including a planar portion and a spherical portion having a hemispherical recessed shape in the planar portion. In the spherical portion are latitude markers formed with a different reflectance from the rest of the spherical portion. The system includes an optical unit with an objective lens and at least one beam splitter. The optical unit transmits light reflected from the hemispherical mirror through the objective lens to a first sensor. A controller measures a numerical aperture of the objective lens by aligning the hemispherical mirror to be at the focus of the objective lens, detecting a back focal image of the objective lens in which the latitude markers appear as darker circular lines, and performing calculations on the image.

公开(公告)号：US12205040B2

公开(公告)日：2025-01-21

申请号：US17245173

申请日：2021-04-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yoonsung Bae ,  Seungho Gwak ,  Kwangrak Kim ,  Seunggun Byoun ,  Gilwoo Song ,  Younghoon Shin ,  Kyungwon Yun ,  Chiyoung Lee ,  Taeyong Jo

IPC: G06N3/088 ,  G06N3/042 ,  G06N3/045 ,  G06N3/067 ,  H01L21/66

Abstract: A method of manufacturing a semiconductor device includes forming a pattern on a wafer, measuring a spectrum of the pattern on the wafer, with a spectral optical system, performing an analysis of the spectrum through a deep learning model for predicting pattern characteristics, the deep learning model being trained based on a domain knowledge, and evaluating the pattern on the wafer based on the analysis of the spectrum, wherein the domain knowledge includes a noise inducing factor of the spectral optical system.