SUBSTRATE SUPPORT DEVICE
    1.
    发明公开

    公开(公告)号:US20240318314A1

    公开(公告)日:2024-09-26

    申请号:US18609067

    申请日:2024-03-19

    CPC classification number: C23C16/4586 C23C16/46

    Abstract: A substrate support device includes a chuck plate, a shaft connected to a center lower end of the chuck plate, a heater unit provided inside the chuck plate, an electrode unit provided inside the chuck plate, and provided on the heater unit, a jumper unit provided inside the chuck plate, arranged between the electrode unit and the heater unit, and electrically connected to the electrode unit to supply power to the electrode unit, and a power control unit, wherein the electrode unit includes a center electrode and a first electrode arranged in a ring shape around the center electrode, wherein the jumper unit includes a first jumper connected to the first electrode and a center jumper connected to the center electrode, and wherein the first jumper includes a first connection jumper, and a first inclined jumper electrically connecting the first jumper.

Patent Agency Ranking