公开(公告)号：US20250146917A1

公开(公告)日：2025-05-08

申请号：US19018240

申请日：2025-01-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yoonbum NAM ,  Namkyun KIM ,  Seungbo SHIM ,  Donghyeon NA ,  Naohiko OKUNISHI ,  Dongseok HAN ,  Minyoung HUR ,  Byeongsang KIM ,  Kuihyun YOON

IPC: G01N9/24 ,  H01Q1/40 ,  H01Q9/30

Abstract: An apparatus for measuring parameters of plasma includes a cutoff probe. The cutoff probe includes: a first antenna having a line shape and configured to emit a microwave to the plasma in response to the signal provided by at least one processor; a second antenna having a line shape and configured to generate an electrical signal in response to receiving the microwave emitted by the first antenna and transferred through the plasma; a first insulating layer; a second insulating layer; a first shield; a second shield; an end protection layer covering an end of each of the first insulating layer, the second insulating layer, the first shield, and the second shield; a first antenna protection layer, of insulating nature, covering the first antenna; and a second antenna protection layer, of insulating nature, covering the second antenna.