公开(公告)号：US20250093558A1

公开(公告)日：2025-03-20

申请号：US18966876

申请日：2024-12-03

Applicant: SCHOTT AG

Inventor： Martin Schaefer ,  Marco Weisenburger ,  Volker Seibert ,  Thomas Westerhoff

IPC: G02B5/10 ,  C03B19/02 ,  C03C10/00 ,  G02B7/183

Abstract: A mirror substrate is made of a material having a coefficient of mean linear thermal expansion of less than or equal to 1*10−6/K. The mirror substrate includes at least one of: a ratio of a lateral dimension to a maximum thickness of at least 100,, a weight per unit area of 100 kg/m2 or less,, and a mirror surface with a roughness (Ra) of at most 3.5 μm.

公开(公告)号：US12265240B2

公开(公告)日：2025-04-01

申请号：US16535401

申请日：2019-08-08

Applicant: SCHOTT AG

Inventor： Martin Schaefer ,  Marco Weisenburger ,  Volker Seibert ,  Thomas Westerhoff

IPC: G02B5/10 ,  C03B19/02 ,  C03C10/00 ,  G02B7/183

Abstract: A mirror, a mirror substrate, a method for producing are provided. The mirror substrate is made of a material having a coefficient of mean linear thermal expansion of less than or equal to 1*10−6/K. The mirror substrate includes at least one feature selected from a group consisting of: a ratio of a lateral dimension to a maximum thickness of at least 100, a ratio of the lateral dimension to the maximum thickness of at least 150, a ratio of the lateral dimension to the maximum thickness of at least 200, a ratio of the lateral dimension to the maximum thickness of at least 300, a weight per unit area of 100 kg/m2 or less, a weight per unit area of 50 kg/m2 or less, a weight per unit area of 30 kg/m2 or less, a weight per unit area of 15 kg/m2 or less, a mirror surface with a roughness (Ra) of at most 3.5 μm, and a mirror surface with a roughness (Ra) of less than 1.2 μm.

公开(公告)号：US20200049868A1

公开(公告)日：2020-02-13

申请号：US16535401

申请日：2019-08-08

Applicant: SCHOTT AG

Inventor： Martin Schaefer ,  Marco Weisenburger ,  Volker Seibert ,  Thomas Westerhoff

IPC: G02B5/10 ,  C03B19/02 ,  C03C10/00

Abstract: A mirror, a mirror substrate, a method for producing are provided. The mirror substrate is made of a material having a coefficient of mean linear thermal expansion of less than or equal to 1*10−6/K. The mirror substrate includes at least one feature selected from a group consisting of: a ratio of a lateral dimension to a maximum thickness of at least 100, a ratio of the lateral dimension to the maximum thickness of at least 150, a ratio of the lateral dimension to the maximum thickness of at least 200, a ratio of the lateral dimension to the maximum thickness of at least 300, a weight per unit area of 100 kg/m2 or less, a weight per unit area of 50 kg/m2 or less, a weight per unit area of 30 kg/m2 or less, a weight per unit area of 15 kg/m2 or less, a mirror surface with a roughness (Ra) of at most 3.5 μm, and a mirror surface with a roughness (Ra) of less than 1.2 μm.

公开(公告)号：US20150053836A1

公开(公告)日：2015-02-26

申请号：US14527995

申请日：2014-10-30

Applicant: SCHOTT AG

Inventor： Martin Schaefer ,  Thorsten Doehring ,  Volker Seibert ,  Thomas Westerhoff ,  Hans-Joachim Nowak

IPC: G02B7/182

CPC classification number: G02B7/182 ,  G02B5/10 ,  G02B7/183 ,  Y10T428/24165 ,  Y10T428/24289 ,  Y10T428/24306 ,  Y10T428/2495

Abstract: In a substrate, particularly in a substrate for a mirror support, in which recesses are introduced in one surface, preferably in the back side of the substrate, as a result of which, in particular, bridging pieces are defined between the recesses, in order to achieve the situation that despite a reduced weight, a high rigidity still remains, which means only a slight sagging after its correct uptake in a holding device provided for it, it is provided that at least one first portion of the bridging pieces has a width that is different than a second portion of the bridging pieces.

Abstract translation: 在基板中，特别是在用于反射镜支撑的基板中，其中凹部被引入到一个表面中，优选地在基板的背面中被引入，结果，特别地，桥接件被定义在凹部之间，按顺序 为了实现尽管重量减轻的情况，仍然保留高刚性，这意味着在为其设置的保持装置中正确吸收之后只有轻微的下垂，条件是桥接件的至少一个第一部分具有宽度 这不同于桥接件的第二部分。