公开(公告)号：US20250009083A1

公开(公告)日：2025-01-09

申请号：US18887169

申请日：2024-09-17

Applicant: SEIKO EPSON CORPORATION

Inventor： Satoshi YAMAUCHI ,  Kenichiro MATSUMOTO ,  Toru TAKIUCHI ,  Yuki YAMASHITA

IPC: A44C5/24

Abstract: A band includes a clasp, wherein the clasp includes a cover member and an adjustment portion, the adjustment portion includes a pair of rail portions that are arranged along inner sides of two side walls of the cover member in a longitudinal direction of the cover member and have a plurality of grooves for length adjustment, a pressing portion that is disposed at an inner bottom surface of the cover member and includes an elastic member, and an engagement pin that is inserted through the one end of a adjustment piece and is configured to be engaged with the grooves of the rail portions, and the pressing portion is configured to press the engagement pin against the rail portions in a state where the engagement pin is engaged with the pair of grooves.

公开(公告)号：US20220338600A1

公开(公告)日：2022-10-27

申请号：US17727903

申请日：2022-04-25

Applicant: Seiko Epson Corporation

Inventor： Yuki YAMASHITA ,  Takumi OSHIO ,  Toru TAKIUCHI

IPC: A44C5/14

Abstract: A band includes a spring rod including a first operation lever linked to a first slider and a second operation lever linked to a second slider, a first piece including a first portion, a second portion, and a linkage section that links the first portion and the second portion to each other, the first piece having a first recess in each of the first portion and the second portion, and a second piece disposed between the first portion and the second portion, the second piece having a second recess. The spring rod is disposed in a closed curve that is the combination of a left first recess, a right first recess, and the second recess in the side view viewed in an axial direction of the spring rod. The second piece is disposed between the first operation lever and the second operation lever.

公开(公告)号：US20230240415A1

公开(公告)日：2023-08-03

申请号：US18163462

申请日：2023-02-02

Applicant: SEIKO EPSON CORPORATION

Inventor： Satoshi YAMAUCHI ,  Kenichiro MATSUMOTO ,  Toru TAKIUCHI ,  Yuki YAMASHITA

IPC: A44C5/24

CPC classification number: A44C5/246

Abstract: A band includes a clasp, wherein the clasp includes a cover member and an adjustment portion, the adjustment portion includes a pair of rail portions that are arranged along inner sides of two side walls of the cover member in a longitudinal direction of the cover member and have a plurality of grooves for length adjustment, a pressing portion that is disposed at an inner bottom surface of the cover member and includes an elastic member, and an engagement pin that is inserted through the one end of a adjustment piece and is configured to be engaged with the grooves of the rail portions, and the pressing portion is configured to press the engagement pin against the rail portions in a state where the engagement pin is engaged with the pair of grooves.

公开(公告)号：US20250130530A1

公开(公告)日：2025-04-24

申请号：US18919528

申请日：2024-10-18

Applicant: SEIKO EPSON CORPORATION

Inventor： Koki HAYASHI ,  Kenichiro MATSUMOTO ,  Toru TAKIUCHI ,  Eiichi HIRAYA ,  Toru KAWASAKI

IPC: G04B19/28

Abstract: A timepiece includes hands that indicate time; a movement that drives the hands; a case band that stores the movement; a rotating bezel provided to be rotatable with respect to the case band; and a rotating bezel pressing ring fixed to the case band. The rotating bezel pressing ring includes a protruding portion that protrudes outward in a radial direction, and that holds the rotating bezel between the protruding portion and the case band. The protruding portion is provided with an annular restriction portion in which a plurality of restricted portions are continuous with each other in a circumferential direction. The rotating bezel is provided with a restricting member that engages with the restricted portion. When the rotating bezel is rotated, the restricting member sequentially engages with the restricted portions, so that a click feeling is generated in the rotational operation of the rotating bezel, and a position of the rotating bezel is restricted.