公开(公告)号：US20210003883A1

公开(公告)日：2021-01-07

申请号：US16609767

申请日：2019-08-27

Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

Inventor： Xue LIU

IPC: G02F1/1335 ,  G02F1/1333

Abstract: A preparation method of a black matrix on a glass substrate and an application of the preparation method are provided. The method includes the following steps: Step S1, providing a glass substrate and forming a photoresist layer on the glass substrate by applying a photoresist; Step S2, forming a plurality of photoresist grooves on the photoresist layer; Step S3, filling the photoresist grooves with a black matrix photoresist; Step S4, exposing the black matrix photoresist to obtain the black matrix. The method may make a line width of the black matrix thinner, make a taper angle larger, and satisfy the requirement of high resolution, which improves aperture ratio of products. Furthermore, because steps of development process decrease in number and become simpler, the method is easy to be realized without difficulties. Therefore, occurrences of a small taper angle, undercut, and peeling phenomenon of the black matrix are reduced.