CLEANING BASE STATION AND CLEANING SYSTEM
    1.
    发明公开

    公开(公告)号:US20230148816A1

    公开(公告)日:2023-05-18

    申请号:US17899689

    申请日:2022-08-31

    CPC classification number: A47L9/2873 A47L9/2847 A47L2201/028

    Abstract: A cleaning base station for a cleaning robot is disclosed. The cleaning base station includes a base station body, a cleaning structure, a first liquid storage structure and a second liquid storage structure. The base station body defines a cleaning space where the cleaning robot is capable of being parked, and the base station body includes a liquid applicating port on an upper side of the cleaning space and a sewage suction outlet on a lower side of the cleaning space. The cleaning structure is installed on a lower side of the cleaning space and is configured to clean a cleaning member of the cleaning robot. The first liquid storage structure is in communication with the liquid applicating port, and the second liquid storage structure is in communication with the sewage suction outlet.

Patent Agency Ranking