公开(公告)号：US20150282595A1

公开(公告)日：2015-10-08

申请号：US14434983

申请日：2013-10-11

Applicant: SHISEIDO COMPANY, LTD.

Inventor： Tomoko Kimura ,  Naomi Kanno ,  Satoshi Yamaki

IPC: A45D40/30

CPC classification number: A45D40/30 ,  A45D2200/1036 ,  A61K8/0204 ,  A61K8/0216 ,  A61K8/735 ,  A61K8/85 ,  A61K2800/884 ,  A61Q17/04

Abstract: The present invention provides a cosmetic method having an excellent secondary adhesion resistance effect.The cosmetic method of the present invention has a step of applying a cosmetic material on the skin, a step of pasting the base material film surface of a thin film on the skin, and a step of removing the support body of the pasted thin film, wherein the thin film consists of a base material film of the thickness of 10 to 500 nm and a support body.

Abstract translation: 本发明提供了具有优异的二次粘合性效果的美容方法。 本发明的美容方法具有将化妆品涂敷在皮肤上的步骤，将薄膜的基材薄膜表面粘贴在皮肤上的步骤，以及除去粘贴薄膜的支持体的步骤， 其中所述薄膜由厚度为10〜500nm的基材膜和支撑体构成。